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	Factors influencing electrochemical oxidation of m-cresol at boron-doped diamond electrode Procházková, Kateřina ; Schwarzová, Karolina (advisor) ; Vyskočil, Vlastimil (referee) This study investigates electrochemical oxidation of m-cresol on boron-doped diamond electrode using direct current voltammetry (DCV), differential pulse voltametry (DPV) and cyclic voltammetry (CV). In aqueous media in pH range 2.0 - 12.0 m-cresol provides one oxidation peak. The electrode reaction is diffusion-controled. Because of electrode passivation two types of pretreatment were applied for reactivation of electrode surface., i.e. alumina polishing and anodic activation using potential of +2400 mV. Peak heights and potentials are strongly dipending on the type of pretreatment for DCV and DPV - the difference in peak potentials can reach 430 mV. Using optimal conditions for alumina polishing in 0.01 μmol·L-1 NaOH the linear dynamic range is 1.0 - 75 μmol·L-1 for DCV and 0.75 - 75 μmol·L-1 for DPV. And for anodic activation in BR buffer pH 2.0 the linear dynamic range is 0.75 - 75 μmol·L-1 for DCV and DPV. The influence of boron-doping level was investigated using a semiconductive and mettalic-type BDD film. For the latter the sensitivity in DP voltammetry is two times higer and for both types the linear dynamic range is ca 1 - 25 μmol·L-1 . The voltammetric response of m-cresol was further investigated in the presence of cationic surfactants. In the presence of CTAB and CPB the peak current... Detailed record
	Characterization of planar and porous boron doped diamond films for electroanalysis Nedvěd, Michal ; Schwarzová, Karolina (advisor) ; Fischer, Jan (referee) Detailed record
	Factors influencing electrochemical oxidation of m-cresol at boron-doped diamond electrode Procházková, Kateřina ; Schwarzová, Karolina (advisor) ; Vyskočil, Vlastimil (referee) This study investigates electrochemical oxidation of m-cresol on boron-doped diamond electrode using direct current voltammetry (DCV), differential pulse voltametry (DPV) and cyclic voltammetry (CV). In aqueous media in pH range 2.0 - 12.0 m-cresol provides one oxidation peak. The electrode reaction is diffusion-controled. Because of electrode passivation two types of pretreatment were applied for reactivation of electrode surface., i.e. alumina polishing and anodic activation using potential of +2400 mV. Peak heights and potentials are strongly dipending on the type of pretreatment for DCV and DPV - the difference in peak potentials can reach 430 mV. Using optimal conditions for alumina polishing in 0.01 μmol·L-1 NaOH the linear dynamic range is 1.0 - 75 μmol·L-1 for DCV and 0.75 - 75 μmol·L-1 for DPV. And for anodic activation in BR buffer pH 2.0 the linear dynamic range is 0.75 - 75 μmol·L-1 for DCV and DPV. The influence of boron-doping level was investigated using a semiconductive and mettalic-type BDD film. For the latter the sensitivity in DP voltammetry is two times higer and for both types the linear dynamic range is ca 1 - 25 μmol·L-1 . The voltammetric response of m-cresol was further investigated in the presence of cationic surfactants. In the presence of CTAB and CPB the peak current... Detailed record

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